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PGMEA/photoresist Solution


Mesolight PGMEA/photoresist solution is made of various materials such as QDs, PGMEA, photoresist and other special surface treatment.It's stable and resistant to photolithography process.It Can maintain a certain conversion efficiency and achieve patterning.It shows high emission spectrum purity, high light conversion efficiency, large emission spectrum range, large extinction coefficient, good film formation, more product types, high solid content, high compatibility.Mesolight PGMEA/photoresist solution is suitable for the preparation of new generation display devices such as QD-OLED, QD-mLED, QDCF-LCD, etc.


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QD PGMEA InP/ZnS

ColorPL EmissionFWHMQYConcentration450nm AbsEQE Product ID
green 530nm <40nm >70% 10-40%wt OD>0.1/um ~35% QD PGMEA InP/ZnS
red 630nm <40nm >70% 10-40%wt OD>0.2/um ~35% QD PGMEA InP/ZnS-1
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QD PGMEA CdSe/ZnS

ColorPL EmissionFWHMQYConcentration450nm AbsEQE Product ID
green 525nm <25nm >80% 10-40%wt OD>0.2/um ~45% QD PGMEA CdSe/ZnS
red 630nm <25nm >80% 10-40%wt OD>0.2/um ~50% QD PGMEA CdSe/ZnS-1
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