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PGMEA/photoresist Solution


Mesolight PGMEA/photoresist solution is made of various materials such as QDs, PGMEA, photoresist and other special surface treatment.It's stable and resistant to photolithography process.It Can maintain a certain conversion efficiency and achieve patterning.It shows high emission spectrum purity, high light conversion efficiency, large emission spectrum range, large extinction coefficient, good film formation, more product types, high solid content, high compatibility.Mesolight PGMEA/photoresist solution is suitable for the preparation of new generation display devices such as QD-OLED, QD-mLED, QDCF-LCD, etc.


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InP-based QD PGMEA solution

ColorPL EmissionFWHMQYConcentration450nm AbsEQEAmount Product ID
Green 525nm <40nm >70% 10-40%wt OD>0.1/um ~35% 2ml InP-based QDs PGMEA-525-2
Green 525nm <40nm >70% 10-40%wt OD>0.1/um ~35% 5ml InP-based QDs PGMEA-525-5
Green 525nm <40nm >70% 10-40%wt OD>0.1/um ~35% 10ml InP-based QDs PGMEA-525-10
Red 630nm <45nm >70% 10-40%wt OD>0.2/um ~35% 2ml InP-based QDs PGMEA-630-2
Red 630nm <45nm >70% 10-40%wt OD>0.2/um ~35% 5ml InP-based QDs PGMEA-630-5
Red 630nm <45nm >70% 10-40%wt OD>0.2/um ~35% 10ml InP-based QDs PGMEA-630-10
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Cd-based QD PGMEA solution

ColorPL EmissionFWHMQYConcentration450nm AbsEQEAmount Product ID
Green 525nm <25nm >80% 10-40%wt OD>0.2/um ~45% 2ml Cd-based QDs PGMEA-525-2
Green 525nm <25nm >80% 10-40%wt OD>0.2/um ~45% 5ml Cd-based QDs PGMEA-525-5
Green 525nm <25nm >80% 10-40%wt OD>0.2/um ~45% 10ml Cd-based QDs PGMEA-525-10
Red 630nm <30nm >80% 10-40%wt OD>0.2/um ~50% 2ml Cd-based QDs PGMEA-630-2
Red 630nm <30nm >80% 10-40%wt OD>0.2/um ~50% 5ml Cd-based QDs PGMEA-630-5
Red 630nm <30nm >80% 10-40%wt OD>0.2/um ~50% 10ml Cd-based QDs PGMEA-630-10
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