QD-PR solution of Mesolight is made of various materials such as QDs, PGMEA, photoresist and other special surface treatment. It's stable and resistant to photolithography process which can maintain a certain conversion efficiency and achieve patterning. It shows high emission spectrum purity and light conversion efficiency, large emission spectrum range and extinction coefficient, good film formation, more product types, high solid content, high compatibility. It is suitable for the preparation of new generation display devices such as QD-OLED, QD-mLED, QDCF-LCD, etc.
CONSULT NOWCd-based QD-PR | Film Performance | |||
Color | PL/FWHM/QY (nm / nm / %) | QDs Amount (% wt) | 450 nm Abs | EQE (%) |
R | 630 / < 30 / > 80 | 10-40 | OD> 0.2/um | -50 |
G | 525 / < 25 / > 80 | 10-40 | OD> 0.2/um | -45 |
InP-based QD-PR | Film Performance | |||
R | 630 / < 45 / > 70 | 10-40% | OD> 0.2/um | -35 |
G | 525 / < 40 / > 70 | 10-40% | OD> 0.1/um | -35 |
InP-based QD-PR | ||||||||
Color | PL Emission | FWHM | QY | Concentration | 450nm Abs | EQE | Amount | Product ID |
Green | 525nm | <40nm | >70% | 10-40%wt | OD>0.1/um | ~35% | 2/5/10 ml | InP-based QD PR-525 |
Red | 630nm | <45nm | >70% | 10-40%wt | OD>0.2/um | ~35% | InP-based QD PR-630 |
Cd-based QD-PR | ||||||||
Color | PL Emission | FWHM | QY | Concentration | 450nm Abs | EQE | Amount | Product ID |
Green | 525nm | <25nm | >80% | 10-40%wt | OD>0.2/um | ~45% | 2/5/10 ml | Cd-based QD PR-525 |
Red | 630nm | <30nm | >80% | 10-40%wt | OD>0.2/um | ~50% | Cd-based QD PR-630 |
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